Polishing

Nanophase Technologies produces specific nanomaterials intended for ultrafine polishing applications. Nanophase’s brands of ceria, mixed rare earth oxides and alumina provide a superior degree of surface smoothness for glass and metal substrates. These nanomaterials are available in highly concentrated, stable dispersions, at either basic or acidic pH.

Nanophase’s dispersions are used in glass polishing, such as photoblanks, high end optics and information storage platters. In the area of semiconductor polishing our materials provide exceptional planarity and minimal dishing and erosion for these critical electronic components. Examples of CMP applications in the semiconductor polishing areas include; STI & SON structures and copper & tungsten interconnects. Nanophase Technologies is proud of our world-wide mutual exclusivity with Rodel, a subsidiary of Rohm and Haas Company, which covers the use of our ceria for STI and SON applications for CMP.